It seems you are confusing the details and conditions of a contract never disclosed publicly, of base research, where a EU based company spent 20 years and billions of EU funds to create a workable product.
In any case if the US adrenaline fueled diplomacy, starts violating hundreds of years old borders of it's allies, respect for ambiguous IP Laws, will be pretty low in the list of priorities. :-)
> It seems you are confusing the details and conditions of a contract never disclosed publicly
The details have never been disclosed but it is well known that this agreement fell within the domain of national security and export controls.
Here's a press release [1] directly from ASML that references these export controls. Even though this PR actually relaxing DUV controls with respect to the U.S., it reaffirms that "EUV systems are also subject to license requirements."
"To access EUV technology, Intel in 1997 formed the EUV LLC, which entered into a cooperative R&D agreement (CRADA) with DOE. As part of this agreement, Intel and its partners would pay $250 million over three years to cover the direct salary costs of government researchers at the national labs and acquire equipment and materials for the labs, as well as cover the costs of its own researchers dedicated to the project. In return, the consortium would have exclusive rights to the technology in the EUV lithography field of use. At the time, it was the largest CRADA ever undertaken."
In return, the consortium would have exclusive rights to the technology in the EUV lithography field of use
