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The article mentions using "standard lithographic techniques". Wouldn't it run into the same issues with extreme ultraviolet patterning that silicon fabs now face?


I don't know about lithography. Apparently suggested technologies for graphene are rather different.

https://www.technologyreview.com/s/409449/graphene-transisto... — uses narrow (< 10nm) bands of graphene produced by ultrasound.

https://phys.org/news/2016-05-graphene-based-transistor-cloc... — uses some tech I did not understand to put two sheets of graphene very close by and control the tunneling.

Both mention 2-3 orders of magnitude speedup, compared to silicon.




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